Title Group 1 intro micro ✅

Introduction of micro-nano technology Dr. Pham Van Nhat _____________________________________________________________________________________ LAB REPORT _____________________________________________________________________________________ Group 1 22BI13265 Phạm Huy Long 22B13203 Nghiêm Tuấn Khang BA12-155 Trần Nhật Quang
Photolithography I. Procedure Step 1: Prepare the photoresist by dry coating. Using a glass slice as a substrate. The photoresist layer has a thickness of 40 μm. Coat the substrate with 1-4 layers of photoresist. Step 2: Cover the substrate with the prepared photomask Step 3: Prepare Na2CO3 1% to remove unexposed area. Step 4: Expose the substrate by UV (365nm). Each layer corresponds to exposure for 2 seconds. In this experiment, we are using the negative ray, which will create the cross-linking bond in the exposed areas. Step 5: After exposure, the exposed area will be highlighted. And then, heat it up for 1 min. Step 6: Then, develop substrate in Na2CO3 1% to remove unexposed area. After that we use water to wash the develop solvent and use the air compressor to dry it.
(From left to right: heater plate, laminator, X-ray system)
II. Result After the experiment we have totally 4 samples: From top to bottom: - Quang’s sample using 2 layers of photoresist - Khang’s sample using 2 layers of photoresist - Long’s sample using 1 layer of photoresist - Our sample using 3 layer of photoresist